IEEE - Institute of Electrical and Electronics Engineers, Inc. - Rejection of P/sup +/ contamination in P/sup ++/ implants on the Eaton 8250

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Rathmell, R.D. ; King, M.L. ; Kamenitsa, D.E. ; Rathmell, M.A.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812193
Regular:

Implants with P/sup ++/ have some risk of contamination with P/sup +/ at approximately half the desired energy. The dimer P/sub 2//sup +/ breaks up after extraction resulting in P/sup +/ ions that... View More

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