IEEE - Institute of Electrical and Electronics Engineers, Inc. - Characterization of a high current ultra low energy ion implanter

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Ranganathan, R. ; Krull, W. ; Sundstrom, H. ; Mack, M. ; Sedgewick, J. ; Eddy, R.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812192
Regular:

The process performance of a high current ultra low energy machine over a wide range of energies (200 eV to 30 keV) and high beam currents is characterized. Designed to meet the production needs... View More

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