IEEE - Institute of Electrical and Electronics Engineers, Inc. - Optical densitometry as a monitor for sub 5 keV implants

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Rendon, M.J. ; McMillen, J.A. ; Gruhn, T.A.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812188
Regular:

As the minimum implant energies for semiconductor processing continue to fall below 5 keV new ion implant tool sets are being placed into production that cannot be monitored in-line effectively at... View More

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