IEEE - Institute of Electrical and Electronics Engineers, Inc. - Quantitative measurements of energy contamination in ULE2 deceleration

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Halling, M. ; Krull, W.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812184
Regular:

Deceleration is used in several new implanters to produce large fluxes of low energy ions, but charge exchange in the beamlines produces energy contamination. We have found that several issues... View More

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