IEEE - Institute of Electrical and Electronics Engineers, Inc. - Stabilization and stripping of high current implanted photoresists

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Marshall, D. ; Freer, B. ; Ameen, M. ; Whiteside, D. ; Dahrooge, G. ; Getchell, D.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812183
Regular:

The scope of this investigation was to increase the throughput of high current implantation and study the impact on the supporting tool set, photostabilization and photoresist strip. In this... View More

Advertisement