IEEE - Institute of Electrical and Electronics Engineers, Inc. - Use of a new thermal wave technology for ultra-shallow junction implant monitoring

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Li Zhou ; Li Chen ; Hovinen, M. ; Salnick, A. ; Rendon, M.J. ; Jinghong Shi
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812182
Regular:

In this paper we present a new approach to the issues of characterization of ion-implanted semiconductors using the thermal wave technology. An experimental thermal wave system with enhanced... View More

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