IEEE - Institute of Electrical and Electronics Engineers, Inc. - Performance of a new silicon-coated disk material: disk manufacturing control and device production experience

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Stone, L. ; Becker, R. ; Gerghty, R. ; Stone, D. ; Kopalidis, P. ; Justesen, P. ; Bratschun, A.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812181
Regular:

As the common metal contaminants requirements in ion implanters approach the /spl les/E10 cm/sup 2/ range, the selection of proper material for critical beam strike areas has become a major factor... View More

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