IEEE - Institute of Electrical and Electronics Engineers, Inc. - Advanced in-situ particle monitor for Applied Materials implanter applications

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Simmons, J. ; Hilkene, M. ; Scottney-Castle, M. ; Wagner, D.W. ; Mitchell, J.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812180
Regular:

In-situ particle monitors offer significant benefits in cost of ownership for ion implant applications. Particle excursions and out-of-control conditions are detected and alarmed as they occur,... View More

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