IEEE - Institute of Electrical and Electronics Engineers, Inc. - Recent advances in XPS characterization of ultra-thin oxides

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Shallenberger, J.R. ; Cole, D.A. ; Downey, D.F. ; Falk, S. ; Zhiyong Zhao
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812179
Regular:

As ion energies have steadily decreased over the past several years, an ever increasing fraction of the implanted species lies in the outer 10 nm of the sample. Consequently, there is an increased... View More

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