IEEE - Institute of Electrical and Electronics Engineers, Inc. - Automatic generation of pressure compensation factors

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Kariya, H. ; Sano, M. ; Tsukihara, M. ; Sugitani, M.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812178
Regular:

It is well known in ion implantation onto photo resist (PR) coated wafers that there occurs a dose shift due to PR outgassing which encounters a charge exchange reaction to ion beams. It is proven... View More

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