IEEE - Institute of Electrical and Electronics Engineers, Inc. - Monitoring low dose implants with advanced ThermaWave and capacitance-voltage

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Curello, G. ; Gallacher, B. ; Carroll, D. ; Carsch, R. ; Graves, P. ; Chen, L. ; Kandler, E. ; Herlocher, R.H.Y.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812174
Regular:

In this work a performance evaluation of some of the most recently improved instruments for low implant dose measurement based on Therma-Wave and Capacitance-Voltage techniques has been carried... View More

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