IEEE - Institute of Electrical and Electronics Engineers, Inc. - Charge exchange in Eaton's NV-8250 medium current ion implanter

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Curello, G. ; McWilliams, T.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812173
Regular:

Charge exchange occurring as a result of interaction between incident ions and residual gases can cause electron capture and lose processes that can lead to partial neutralization or stripping of... View More

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