IEEE - Institute of Electrical and Electronics Engineers, Inc. - Process control enhancements in a medium current implanter: (1) 2/spl times/ improvement in dose repeatability (2) maximum dose sensitivity at 70 keV

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Rosenblatt, D.H. ; Rossman, D.M.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812170
Regular:

A medium current implanter at National Semiconductor was upgraded to obtain better dose repeatability and uniformity. Major enhancements were made in the cup calibration, scanning, beam profiling,... View More

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