IEEE - Institute of Electrical and Electronics Engineers, Inc. - High energy, low dose ion implant monitoring using the OMS-3000

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Dyer, D.E. ; Gruhn, T.A. ; McMillen, J.A.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812167
Regular:

With the applications for high energy ion implant increasing in production, the need has arisen for a metrology technique that is capable of providing effective process control capability without... View More

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