IEEE - Institute of Electrical and Electronics Engineers, Inc. - Charge control performance of an ultra-low energy ion implanter

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Dyer, D.E. ; Krull, W.A. ; Ranganathan, R. ; Sedgewick, J.E. ; Rendon, M.J.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812166
Regular:

This paper describes an evaluation the charge control characteristics of an inline plasma cell installed at the end of the beamline on an Eaton NV-GSD/ULE2 (ULE) ultra-low energy ion implanter.... View More

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