IEEE - Institute of Electrical and Electronics Engineers, Inc. - Influence of wafer backside organic contamination on GOI

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Hayashi, T. ; Kusakabe, U. ; Yanagisawa, Y. ; Kamata, T.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812162
Regular:

The influence of wafer backside organic contamination caused by an ion implanter was investigated. When its wafer stage was contaminated with certain organic compounds such as DOP, they were... View More

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