IEEE - Institute of Electrical and Electronics Engineers, Inc. - An analytical model for beam induced contamination in ion implantation

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Ryssel, H. ; Frey, L. ; Haublein, V. ; Lucassen, M. ; Gyulai, J.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812161
Regular:

Ion beam induced contamination in ion implanters is controlled by three processes. Impurities are sputtered from components and reach the wafer surface, recoil implantation of contamination and... View More

Advertisement