IEEE - Institute of Electrical and Electronics Engineers, Inc. - Photoresist effects on wafer charging control: current-voltage characteristics measured with Charm-2 monitors during high-current As/sup +/ implantation

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Current, M. ; Foad, M.A. ; Brown, S. ; Lukaszek, W. ; Vella, M.C.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812159
Regular:

The effects of ion energy, accumulated dose, photoresist coverage and patterning were studied for As/sup +/ implants at 40, 60 and 120 keV and total doses from 1/spl times/10/sup 14/ to 10/sup 16/... View More

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