IEEE - Institute of Electrical and Electronics Engineers, Inc. - Surface sensitive redistribution of low energy implanted B in Si substrate

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Natsuaki, N. ; Shima, A. ; Honda, M. ; Nagayama, S. ; Sato, H. ; Hashimoto, T.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812155
Regular:

The impact of the surface treatment on the redistribution of low energy implanted boron atoms is investigated for deep sub-micron ULSI processing. It is of importance to control the ambient and... View More

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