IEEE - Institute of Electrical and Electronics Engineers, Inc. - Progress in ion implantation technology for advanced ULSI device fabrication

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Sato, S.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812154
Regular:

Ultra shallow junction formation is one of the crucial problems in the scaling of device size. Many methods have been proposed in order to fabricate junctions below 30 nm in devices below 0.1 /spl... View More

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