IEEE - Institute of Electrical and Electronics Engineers, Inc. - SIMS modular approach to ultra-low energy implants for accurate TCAD process simulation modeling

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Chia, V.K.F. ; Edgell, M.J. ; Biswas, S.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812152
Regular:

The use of technology computer-aided design (TCAD) for IC design, technology development and semiconductor fabrication has grown. The motivation of new users of TCAD is to solve technology... View More

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