IEEE - Institute of Electrical and Electronics Engineers, Inc. - Production of multiply charged ions by utilizing pulsed ECR plasma

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Kato, Y. ; Ishii, S.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812150
Regular:

Fundamental phenomena of an electron cyclotron resonance (ECR) multicharged ion source (2.45 GHz) have been experimentally studied. The ECR plasma is confined in the mirror field superimposed by... View More

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