IEEE - Institute of Electrical and Electronics Engineers, Inc. - ULE beamline optics

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Benveniste, V.M. ; Kellerman, P. ; Graf, M.A.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812146
Regular:

A beamline was developed specifically for production and transport of high perveance ion beams. Space charge effects are addressed at three stages of the beamline: extraction system, mass resolver... View More

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