IEEE - Institute of Electrical and Electronics Engineers, Inc. - A new developed in-line dose monitor

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Hisamune, T. ; Niikura, K. ; Kimura, N. ; Yokoo, H. ; Nishihashi, T. ; Kashimoto, K. ; Samurada, Y. ; Kitamura, T. ; Takeshita, M. ; Yajima, T. ; Yasaka, M.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812141
Regular:

For the new generation ion implantation, a standard criterion in order to evaluate the uniformity and the absolute dose for low dose implantation down to 1E11/cm/sup 2/ is indispensable. A dose... View More

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