IEEE - Institute of Electrical and Electronics Engineers, Inc. - High-speed scanning system for large ion beams

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Ogata, S. ; Sasaki, N. ; Iwase, Y. ; Kunibe, T. ; Sugimoto, R. ; Yokoo, H. ; Suzuki, H. ; Fujiyama, J. ; Yuyama, J. ; Sakurada, Y.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812139
Regular:

Single wafer processing high current ion implanter is one of the leading candidates for the new generation semiconductor and LCD manufacturing line-up. As its key-technology, ULVAC has developed a... View More

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