IEEE - Institute of Electrical and Electronics Engineers, Inc. - Uniformity and dosimetry study of the 30 kV Danfysik decel lens system

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Gwilliam, R. ; Nejim, A. ; Knights, A. ; Sealy, B.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812132
Regular:

In this paper we report on the uniformity and the dosimetry achieved using a decel system designed by Danfysik and fitted to their high current DF1090 research implanter housed within the Surrey... View More

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