IEEE - Institute of Electrical and Electronics Engineers, Inc. - Pressure based mass flow control for ion implant SDS applications

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Brown, R.L. ; Schwartz, J.M.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812130
Regular:

Thermal mass flow control (MFC) has been used to control the flow of gas in semiconductor process systems for many years. With the introduction of SDS gas sources for ion implantation,... View More

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