IEEE - Institute of Electrical and Electronics Engineers, Inc. - Enhancements to the Eaton GSD200 beamline for low energy boron operation

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Splinter, P. ; Chen, J. ; Barusso, S. ; Fascetti, M.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812129
Regular:

Enhancements to existing high current ion implanter beamlines can extend the use of this equipment to provide an operational bridge to the technology node of 0.18 /spl mu/m. Through iterative... View More

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