IEEE - Institute of Electrical and Electronics Engineers, Inc. - Positive control of uniformity in ribbon beams for implantation of flat-panel displays

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): White, N.R. ; Satoh, S. ; Bell, E.W. ; Sieradzki, M. ; Geary, C. ; Degawa, T. ; Shimamura, K. ; Ochi, M.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812126
Regular:

A mass-analyzed ion implanter for flat-panel displays has been developed, based on a 650mm-wide parallel ribbon ion beam. The panels are serially scanned at a controlled velocity through the... View More

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