IEEE - Institute of Electrical and Electronics Engineers, Inc. - Beam characterizations of mass separated, low-energy positive and negative ions deposition apparatus

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Tsubouchi, N. ; Horino, Y. ; Wada, M. ; Oomori, H.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812125
Regular:

The authors study properties of positive and negative ion beams mainly focused on the characterizations of the ion beam energy on a newly developed apparatus for isotopically mass separated,... View More

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