IEEE - Institute of Electrical and Electronics Engineers, Inc. - Monitoring system of reliability and repeatability of pressure compensation

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Sano, M. ; Kabasawa, M. ; Kariya, H. ; Sugitani, M.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812118
Regular:

It is well known that charge exchange phenomena are great issues on ion implanters, because they cause discrepancies such as dose shifts. To reduce the dose shifts, we introduced the system,... View More

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