IEEE - Institute of Electrical and Electronics Engineers, Inc. - Correlation of H/sup -/ density and work function of a plasma electrode in H/sub 2/+alkali (Rb, Cs) plasma

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Nishiura, M. ; Sasao, M. ; Wada, M.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812117
Regular:

The work function of the plasma electrode of an H/sup -/ ion source was measured photoelectrically in H/sup 2/ plasma, which contains vapor of an alkali metal. The measured work function was... View More

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