IEEE - Institute of Electrical and Electronics Engineers, Inc. - Ion implanter with a magnetic neutral loop discharge (NLD) plasma ion source for surface modification

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Matsuura, M. ; Ohtsuka, Y. ; Yokoo, H. ; Sakurada, Y.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812116
Regular:

An ion implanter, the ULVAC ILD-600, which employs a new broad-beam ion source termed a "magnetic neutral loop discharge (NLD) plasma ion source" has been developed. NLD plasma is a high density... View More

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