IEEE - Institute of Electrical and Electronics Engineers, Inc. - Automatic determination of pressure compensation factors without requiring wafer implants

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Halling, M. ; Krull, W. ; Chen, H. ; Ring, P.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812115
Regular:

The ion beam is neutralized by interactions with the gas molecules present in the process chamber during wafer implant, and thus pressure compensation of this neutralization is necessary to... View More

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