IEEE - Institute of Electrical and Electronics Engineers, Inc. - Real-time monitoring of ion source plasma using optical emission spectroscopy

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Graf, M.A. ; Benveniste, V.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812113
Regular:

Optical emission spectroscopy has been used to monitor in real-time the inductively coupled RF plasma in the ULE2 ion source. A model has been developed to correlate optical spectra from the... View More

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