IEEE - Institute of Electrical and Electronics Engineers, Inc. - Overview of the Eaten 8250 medium current implanter

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Harlan, J.M. ; Petry, K.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812103
Regular:

Eaton has developed a second generation parallel scanning medium current implanter. This implanter accomplishes hybrid scanning using a novel electrostatic scan angle correction lens to produce... View More

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