IEEE - Institute of Electrical and Electronics Engineers, Inc. - Characterization of a high throughput implanter for the low temperature polysilicon AMLCD industry

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Shao, Y. ; Blake, J. ; Chen, K. ; Brailove, A. ; King, M. ; Sato, M.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812099
Regular:

The ORion 6072 implanter was introduced over one year ago. It exploits the cost advantages of a ribbon beam without mass analysis and achieves high throughput through active panel cooling in... View More

Advertisement