IEEE - Institute of Electrical and Electronics Engineers, Inc. - Abatement of hazardous ion implant gases: experimental results

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Arno, J. ; Boyd, W. ; Rendon, M.J. ; Romig, T.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812097
Regular:

The hazardous and reactive nature of the materials utilized during ion implantation generates environmental, safety, and handling challenges. Many new concerns are triggered by recent transitions... View More

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