IEEE - Institute of Electrical and Electronics Engineers, Inc. - Optimization of the plasma-sputter-type negative ion source

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Oomori, H. ; Kasuya, T. ; Wada, M. ; Horino, Y. ; Tsubouchi, N.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812094
Regular:

A study is being made to increase the beam current of the negative ions extracted from a plasma-sputter-type ion source operated with Cs. The result of the mass analysis showed that polyatomic... View More

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