IEEE - Institute of Electrical and Electronics Engineers, Inc. - Diagnostics and modeling in the development of the VIISta 810 ion implanter

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Cucchetti, A. ; Renau, A. ; Buff, J.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812089
Regular:

At different stages in the development of the VIISta 810, Varian's new 200/300 mm medium current implanter, extensive experimental measurements were taken for a wide range of beams. These... View More

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