IEEE - Institute of Electrical and Electronics Engineers, Inc. - Scanned beam uniformity control in the VIISta 810 ion implanter

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Olson, J.C. ; Renau, A. ; Buff, J.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812079
Regular:

The VIISta 810 is Varian's new 200 mm/300 mm serial medium current ion implanter. Scanning of the beam in the horizontal direction over the required distance is achieved through the use of an... View More

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