IEEE - Institute of Electrical and Electronics Engineers, Inc. - Oxide thickness determination by XPS, AES, SIMS, RBS and TEM

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Shallenberger, J.R. ; Cole, D.A. ; Novak, S.W. ; Moore, R.L. ; Edgell, M.J. ; Smith, S.P. ; Hitzman, C.J. ; Kirchhoff, J.F. ; Principe, E. ; Biswas, S. ; Bleiler, R.J. ; Nieveen, W. ; Jones, K.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812056
Regular:

As the R/sub p/ of ion implants steadily decreases, an ever-increasing percentage of the implant species lies in the oxide layer and is, therefore, not electrically active. For this reason it is... View More

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