IEEE - Institute of Electrical and Electronics Engineers, Inc. - Characteristics of Er/sup 3+/:Al/sub 2/O/sub 3/ thin-films deposited by reactive co-sputtering for application in optical amplification

1999 IEEE LEOS Annual Meeting Conference Proceedings. LEOS'99. 12th Annual Meeting

Author(s): Musa, S. ; van Weerden, H.J. ; Yau, T.H. ; Lambeck, P.V.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: San Francisco, CA, USA, USA
Conference Date: 8 November 1999
Volume: 2
ISBN (Paper): 0-7803-5634-9
ISSN (Paper): 1092-8081
DOI: 10.1109/LEOS.1999.811985
Regular:

Er/sup 3+/-doped Al/sub 2/O/sub 3/ films have been deposited by reactive co-sputtering onto thermally oxidized Si-wafers for use in optical amplification. Low background losses and broad emission... View More

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