IEEE - Institute of Electrical and Electronics Engineers, Inc. - A novel IR monitoring system for organic contaminants on 300-mm silicon wafer surfaces

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Author(s): Yoshida, H. ; Endo, M. ; Maeda, Y. ; Niwano, M. ; Miyamoto, N.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Santa Clara, CA, USA, USA
Conference Date: 11 October 1999
Page(s): 457 - 460
ISBN (Paper): 0-7803-5403-6
ISSN (Paper): 1523-553X
DOI: 10.1109/ISSM.1999.808835
Regular:

A new infrared (IR) monitoring system has been developed for the detection of organic contaminants on 300 mm silicon wafer surfaces with non-contact, non-destructive, high sensitivity, and... View More

Advertisement