IEEE - Institute of Electrical and Electronics Engineers, Inc. - Advanced UCT cleaning process based on specific gases dissolved ultrapure water

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Author(s): Morita, H. ; Ida, J. ; Ii, T. ; Ohmi, T.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Santa Clara, CA, USA, USA
Conference Date: 11 October 1999
Page(s): 453 - 456
ISBN (Paper): 0-7803-5403-6
ISSN (Paper): 1523-553X
DOI: 10.1109/ISSM.1999.808834
Regular:

Advanced UCT cleaning process based on specific gases dissolved ultrapure water was developed. It is very simple process consisted of only 4 steps as follows: ozonated ultrapure water cleaning;... View More

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