IEEE - Institute of Electrical and Electronics Engineers, Inc. - Improved cleaning module after tungsten etch

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Author(s): Bloot, A.S. ; Leene, J. ; Sinnott, T. ; Zimmerman, T. ; Gillespie, P.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Santa Clara, CA, USA, USA
Conference Date: 11 October 1999
Page(s): 447 - 448
ISBN (Paper): 0-7803-5403-6
ISSN (Paper): 1523-553X
DOI: 10.1109/ISSM.1999.808832
Regular:

Integrated dry photoresist and residue removal is increasingly being implemented over traditional dry resist strip and wet residue removal process flows. The primary motivation is to improve the... View More

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