IEEE - Institute of Electrical and Electronics Engineers, Inc. - Production technology of high performance slurry without CMP dispersing agent

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Author(s): Karasawa, Y. ; Murase, K. ; Yamaguchi, T. ; Watanabe, K. ; Doy, T.K.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Santa Clara, CA, USA, USA
Conference Date: 11 October 1999
Page(s): 437 - 440
ISBN (Paper): 0-7803-5403-6
ISSN (Paper): 1523-553X
DOI: 10.1109/ISSM.1999.808830
Regular:

A new media-less wet jet mill method has been developed to produce high performance, long stability slurries for CMP (chemical-mechanical polishing). This method features the injection of... View More

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