IEEE - Institute of Electrical and Electronics Engineers, Inc. - Yield enhancement through photoresist characterization at the implant photo operations

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Author(s): Muller, M.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Santa Clara, CA, USA, USA
Conference Date: 11 October 1999
Page(s): 395 - 398
ISBN (Paper): 0-7803-5403-6
ISSN (Paper): 1523-553X
DOI: 10.1109/ISSM.1999.808819
Regular:

This paper will demonstrate the ability to positively impact yield of an IC device through means of photoresist characterization at the implant photo processes. Film characterization and DOE... View More

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