IEEE - Institute of Electrical and Electronics Engineers, Inc. - Novel darkfield patterned inspection system with killer defect control

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Author(s): Sugimoto, A. ; Ikota, M. ; Enomoto, Y.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Santa Clara, CA, USA, USA
Conference Date: 11 October 1999
Page(s): 379 - 382
ISBN (Paper): 0-7803-5403-6
ISSN (Paper): 1523-553X
DOI: 10.1109/ISSM.1999.808815
Regular:

Darkfield defect inspection systems are widely used for inline monitoring since their sampling ratio is high. For yield ramp up it is necessary to combine the enormous amounts of inspection data... View More

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