IEEE - Institute of Electrical and Electronics Engineers, Inc. - Inspection optimization for excursion and baseline defect monitoring in a manufacturing environment

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Author(s): Sajoto, D. ; Gordon, A. ; McCauley, A.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Santa Clara, CA, USA, USA
Conference Date: 11 October 1999
Page(s): 371 - 374
ISBN (Paper): 0-7803-5403-6
ISSN (Paper): 1523-553X
DOI: 10.1109/ISSM.1999.808813
Regular:

This paper proposes a methodology for inspection optimization by utilizing correlation results between in-line defect to end-of-line bit failure, demonstrates its advantages, and shows how to... View More

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